Influence of resist composition on demolding force in UV nanoimprint lithography

Technical Proceedings of the 2010 NSTI Nanotechnology Conference & Expo - Nanotech 2010

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	Nanotech 2010 Vol. 2 Chapter 5: MEMS Fab: Design, Manufacture, Instrumentation Influence of resist composition on demolding force in UV nanoimprint lithography
Authors:	A. Amirsadeghi, J. Lee, S. Park
Affiliation:	Louisiana State University, US
Pages:	272 - 275
Keywords:	nano imprint lithography, UV, demolding force, Young’s modulus
Abstract:	We investigated the influence of the Young’s Modulus (E) of UV resist on the measured demolding force in UV-NIL by varying compositions of UV-curable polymers. We found that decreasing crosslinking content of the polymers decreases the Young’s modulus and polymerization shrinkage and in turn the demolding force.
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