Technical Proceedings of the 2010 NSTI Nanotechnology Conference & Expo - Nanotech 2010
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Nanotech 2010 Vol. 2
Chapter 11: Compact Modeling
Bias Dependence of Low Frequency Noise in 90nm CMOS
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| Authors: | N. Mavredakis, A. Antonopoulos, M. Bucher |
| Affiliation: | Technical University of Crete, GR |
| Pages: | 805 - 808 |
| Keywords: | low frequency noise, carrier fluctuation, number fluctuation, charge model, CMOS |
| Abstract: | The bias dependence of low frequency noise (LFN) is investigated with measurements in 90nm CMOS. A recent charge-based LFN model combining carrier and mobility fluctuation components is compared to data from multi-finger devices with a channel length of L=70nm. LFN in PMOS devices is higher than in NMOS for input referred noise; carrier number fluctuation model allows to well represent increased noise in strong inversion for either transistor type; the mobility fluctuation is significant only in deep weak inversion, and allows to represent the corresponding increase of noise. As a result, input referred noise shows a minimum in moderate inversion, increasing the attractiveness of moderate inversion design. The new model is implemented in the EKV3 MOS transistor compact model, and provides a good qualitative fit for both saturation and linear mode, from weak to strong inversion operation. |
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