Technical Proceedings of the 2010 NSTI Nanotechnology Conference & Expo - Nanotech 2010
Technical Proceedings of the 2010 NSTI Nanotechnology Conference & Expo - Nanotech 2010

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Point-Mass Model for Nano-Patterning Using Dip-Pen Nanolithography (DPN)
Nanotech 2010 Vol. 2

Chapter 4: NanoFab: Manufacture, Instrumentation

Point-Mass Model for Nano-Patterning Using Dip-Pen Nanolithography (DPN)

Authors:S.-W. Kang, D. Banerjee
Affiliation:Texas A&M University, US
Pages:218 - 222
Keywords:Derjaguin-Muller-Toporov, contact theory, vibration, beam theory
Abstract:Micro-cantilevers are frequently used as probes for micro-electromechanical systems (MEMS) based sensing applications. Usually micro-cantilever based sensors work by detecting changes in cantilever vibration modes (e.g., bending or torsional vibration frequency) or surface stresses - when a target analyte is absorbed on its surface. The catalyst for chemical reactions with specific analyte can be deposited by Dip-Pen Nanolithography (DPN) technique. In this study, we simulate the vibration mode in nano-patterning process based on Point-Mass Model (or Lumped Parameter Model). The results of simulation indicate the stability of writing and reading mode in DPN process under a particular driving frequency. In addition, we analyze the sensitivity of tip-sample interaction force in fluid (ink solution) by utilizing the Derjaguin-Muller-Toporov (DMT) contact theory.
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