Technical Proceedings of the 2010 NSTI Nanotechnology Conference & Expo - Nanotech 2010
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Nanotech 2010 Vol. 2
Chapter 3: Micro & Nano Reliability
Advanced In- and Out-off plane High Resolution X-ray Strain Analysis on MEMS
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| Authors: | A. Neels, A. Dommann |
| Affiliation: | CSEM, CH |
| Pages: | 182 - 185 |
| Keywords: | reliability, strain, defect analysis, HRXRD, MEMS |
| Abstract: | Related to the dramatically smaller volume of microelectromecanical systems (MEMS), new methods in testing and qualification are needed. In single crystal silicon (SCSi) based devices, stress and loading in operation introduces defects during the MEMS life time and increases the risk of failure. Reliability studies on potential failure sources have an impact on MEMS design and are essential to assure the long term functioning of the device. In this paper, the application of advanced High Resolution X-ray Diffraction (HRXRD) methods in strain, defect and deformation analysis on MEMS is discussed. Stresses and defects are introduced in the devices during the fabrication process (DRIE, annealing, bonding) and influence the crystalline perfection and therefore have a direct impact on the mechanical properties of MEMS. The here applied in-plane diffraction technique allows to obtain additional information about the device stress state being not accessible by conventional HRXRD methods (out-off plane). |
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