Technical Proceedings of the 2010 NSTI Nanotechnology Conference & Expo - Nanotech 2010
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Nanotech 2010 Vol. 1
Chapter 1: Nanoscale Materials Characterization
Advances in Helium Ion Microscopy for High Resolution Imaging and Material Modification
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| Authors: | W. Thompson, J. Notte, L. Scipioni, M. Ananth, L. Stern, S. Sijbrandij, C. Sanford |
| Affiliation: | Carl Zeiss SMT, US |
| Pages: | 25 - 28 |
| Keywords: | helium ion microscopy, sub-nanometer image resolution, graphene, soft materials collagen fibers |
| Abstract: | The helium ion microscope routinely obtains sub-nanometer resolution on uncoated soft materials with a high signal to damage ratio. In addition to its high resolution imaging capability, the microscope has been successful at sub-nanometer film thickness determination, the patterning of 5 nm free standing graphene wires and the ion induced deposition of a 30nm, 6 micron high, free standing tungsten pillar. We will discuss the microscope and these various recent applications. |
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